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Sputtering system for R&D
Writer DAON

  d2390e4faf1b5c9a2ce8620eb5838fbe_1556848184_1981.jpg 

  • System classification: Sputtering system for R&D
  • General specification
    a. Stainless steel 304 chamber
    b. 1inch cathode (AJA, USA)
    c. RF power supply (Comdel)
    c. TMP (200liter/sec, Shimadzu)
    d. Rotary pump (200liter/min)
    e. Pirani gauge & cold cathod gauge
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